Process Performance

· Patterning using laser and high-speed scanner

· 1064nm pico second laser

Productivity / Hardware

· Very simple process compared to existing patterning processes such as etching and printing

· No need for a protective film removal by enabling selective patterning

· Available in both roll to roll processing and sheet processing

· Environment-friendly process with chemical-free

· Reduced patterning time using high speed laser scanner

· Very little change in haze and transparency after Ag nanowire patterning

· Since no required mask, various patterns can be manufactured by changing program.